Adaptive Twice Laser Patterning for Aviation Thin-Wall Structures Using In-Situ Feature Border Identification

Manufacturing lightweight aviation structures through sequential laser patterning processes faces significant challenges due to deformation and dimensional inaccuracies in large-scale thin-walled components after chemical etching. Unlike conventional methods that rely solely on ideal 3D models for trajectory generation, this study proposes a novel approach that dynamically derives the second laser patterning trajectories by precisely capturing the actual edges of arc-shaped structures formed during the first etching cycle. By integrating point-cloud acquisition with advanced data processing, our solution ensures accurate characterization of post-etching geometries. A customized laser processing system was developed, combining a CO₂ laser with a 6-DOF motion platform and a structured-light 3D scanner to reconstruct the workpiece's digital twin. Through parametric optimization, we identified critical processing conditions (5 W laser power, 40° beam inclination) that achieve complete maskant ablation without substrate damage. Experimental validation on curved components demonstrated successful fabrication of sequential arc-shaped and "wine glass-shaped" structures, proving the method's capability to compensate for etching-induced deformations and processing errors. This work establishes an automated, high-precision framework for multi-step laser patterning in aerospace manufacturing.